The effect of ion energy upon the chemical structure of triglyme and E2OV plasma polymerised films.
Barton, David; Fraser, Stuart; Short, Robert D.; Bradley, James W.
American Physical Society, 55th Gaseous Electronic Conference,
October 15-18, 2002,
Minneapolis, MN, Meeting ID GEC02, abstract #WF1.004
Using energy resolving plasma mass spectrometry, QCM deposition rate monitoring and XPS samples, we have studied the effect of ion energy upon derived polymer film properties. The polymers are produced in a 13.56MHz RF plasma reactor, at a pressure of 50mTorr, and a generator output of 5W. The films are deposited onto a specially designed substrate, behind which are placed the diagnostics. By applying an RF bias to the substrate, which is phase and amplitude matched to the RF potentials in the plasma, we can manipulate the ion energy between set limits. These limits are the time average potential differences Vp-Vsb, down to the DC minimum of Vp-Vf. The subscripts refer to the plasma (p), self bias (sb) and floating (f) potentials respectively. An important feature of this technique is that the bulk plasma is undisturbed, so that ion energy is the only parameter under investigation. Using the monomers triglyme and E20V, chosen for their biological anti-fouling properties, we demonstrate the ability to manipulate film properties by selective control of plasma ion energies
can anyone locate the the physics on this?
how is an RF being imposed to another substance? Is it coherantly maintained, like in polaritonics?
I do not have the pub, so if any can assist on locating this i would like to see what the math looks as the authors define this. (apparently the experiment is already in application)